Shows enhanced defect detection accuracy in industrial imagery, highlighting its broad applicability.
Automated defect detection in materials microscopy is frequently hindered by severe data scarcity and class imbalance. Here, we propose a practical and transferable deep learning framework designed to achieve robust multilabel classification under these constrained conditions. The method integrates a topology-preserving elastic deformation (TPED) strategy, which introduces realistic geometric variability while maintaining semantic consistency, with a lightweight, attention-guided ensemble learner. Validated on directed self-assembly (DSA) block copolymer SEM images, the framework effectively overcomes data set limitations, achieving high micro- and macro-averaged F1-scores across rare and complex defect types. Notably, the model attains an F1-score of 0.987 on the critical discrimination between defect-free and defective samples, approaching human-level precision. To confirm the framework's generalized utility beyond the semiconductor field, we demonstrate its successful transferability to a distinct wood defect data set. Encapsulated in an open-source, no-code graphical user interface, this work offers a scalable, high-precision solution for industrial inspection tasks where labeled data is limited.
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Liu et al. (2026) studied this question.
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