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Review demonstrates improved surface patterning and adhesion in polymers using carbene cross-linking, suggesting new manufacturing strategies.
Photo‐driven carbene cross‐linking represents an emerging, versatile strategy for advanced polymer engineering. By harnessing photogenerated free carbenes from rationally designed diazo and diazirine precursors, this approach enables precise covalent bonding through efficient C─H/X─H (X = N, O, S, etc.) insertion mechanisms. Going beyond a conventional summary, this review establishes a critical bridge between micro‐level photochemistry and macroscopic material performance. We systematically outline fundamental molecular design guidelines, highlighting how the precise regulation of carbene spin states (singlet vs. triplet) and the strategic selection between aryl diazo esters (ADEs) and trifluoromethyl aryl diazirines (TADs) directly dictate oxygen tolerance, lithographic resolution, and ultimate device fidelity. Guided by these foundational principles, we comprehensively review recent breakthroughs of carbene cross‐linkers in high‐resolution surface patterning and robust interfacial adhesion across diverse substrates. The technology's unique combination of spatiotemporal control, substrate independence, and mild processing conditions establishes a versatile platform for next‐generation polymer manufacturing and advanced functional material design.
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Chen et al. (2026) studied this question.
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