We present theoretical results based on density functional theory and kinetic Monte Carlo simulations of silicon deposition and address observations made in recently reported low temperature scanning tunneling microscopy studies. A mechanism is presented which explains dimer formation on top of the substrate's dimer rows at 160 K and up to room temperature, while between-row dimers and longer strings of adatoms (``diluted dimer rows'') form at higher temperature. A crossover occurs at around room temperature between two different mechanisms for adatom diffusion in our model.
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Smith et al. (1996) studied this question.
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