Sensitizing DNA to Secondary Electron Damage:  Resonant Formation of Oxidative Radicals from 5-Halouracils

ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTSensitizing DNA to Secondary Electron Damage: Resonant Formation of Oxidative Radicals from 5-HalouracilsH. Abdoul-Carime, M. A. Huels, E. Illenberger, and L. SancheView Author Information Department of Nuclear Medicine and Radiobiology University of Sherbrooke, QC, Canada Institut für Physikalische und Theoretische Chemie Freie Universität Berlin, Germany Cite this: J. Am. Chem. Soc. 2001, 123, 22, 5354–5355Publication Date (Web):May 10, 2001Publication History Received14 November 2000Published online10 May 2001Published inissue 1 June 2001https://pubs.acs.org/doi/10.1021/ja003952dhttps://doi.org/10.1021/ja003952drapid-communicationACS PublicationsCopyright © 2001 American Chemical SocietyRequest reuse permissionsArticle Views451Altmetric-Citations131LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose SUBJECTS:Anions,Bond cleavage,Electrical energy,Genetics,Group 17 compounds Get e-Alerts