Key points are not available for this paper at this time.
Growth of vertical epitaxial Si(100) nanowires on Si(100) substrates is demonstrated (see figure) using a combination of an anodic aluminum oxide template, catalytic Au particles embedded in nanopores directly on the Si substrate by using electroless deposition, and vapor–liquid–solid growth using SiH4. HF acid treatment of the porous alumina template is important to realize a direct contact between deposited Au in the AAO nanopores and the Si substrate.
Shimizu et al. (Fri,) studied this question.