We evaluate quantum corrections to conductivity in an electrically gated thin film of a three-dimensional topological insulator. We derive approximate analytical expressions for the low-field magnetoresistance as a function of bulk doping and bulk-surface tunneling rate. Our results reveal parameter regimes for both weak localization and weak antilocalization, and include diffusive Weyl semimetals as a special case.
No takes yet. Share an insight, caveat, or question.
Garate et al. (2012) studied this question.