Toward High-Fidelity Fabrication: A Refinement Strategy via Decoupled Photopolymerization Modeling and Simulation for Projection Micro‑Stereolithography

≈ 29.3 μm). Guided by this model, we fabricated gradient MN arrays with a tip precision of 12.8 μm, approaching the optical diffraction limit (10 μm) and representing a 68% accuracy improvement over conventional methods. This work provides a quantitatively driven methodology for defect-free manufacturing of complex microstructures, shifting fabrication from empirical iteration to model-guided precision.