A blue thin film of amorphous silicon has been deposited on a nickel cathode by the electrolysis of a solution of tetraethylorthosilicate in acetic acid. The maximum thickness of the film obtained was about 0.5 μm. The deposit was confirmed to be amorphous silicon by IR reflection spectra, RHEED, and nondispersive x‐ray analysis in the scanning electron microscope.
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Takeda et al. (1981) studied this question.