Key points are not available for this paper at this time.
A approach to nanolithography based on the self-assembly and formation of mono-micellar films of a diblock-copolymer is reported. The Figure shows the formation of islands using an inorganically modified micellar mask. Au3+ in the micelles leads to islands while the formation of a Au-nanoparticle in each single micelle results in holes, owing to an inversion of the etching rate.
Spatz et al. (Mon,) studied this question.