Stabilizing Ni Catalysts by Molecular Layer Deposition for Harsh, Dry Reforming Conditions

To inhibit sintering of ∼5 nm supported Ni particles during dry reforming of methane (DRM), catalysts were stabilized with porous alumina grown by ABC alucone molecular layer deposition (MLD). The uncoated catalyst continuously deactivated during DRM at 973 K. In contrast, the DRM rates for the MLD-coated catalysts initially increased before stabilizing, consistent with an increase in the exposed nickel surface area with exposure to high temperatures. Post-reaction particles were smaller for the MLD-coated catalysts. Catalysts with only 5 MLD layers had higher DRM rates than the uncoated catalyst, and a sample with 10 MLD layers remained stable for 108 h.