Computer Modeling of Plasmas and Plasma‐Surface Interactions

In this paper, an overview is given of different modeling approaches used for describing gas discharge plasmas, as well as plasma‐surface interactions. A fluid model is illustrated for describing the detailed plasma chemistry in capacitively coupled rf discharges. The strengths and limitations of Monte Carlo simulations and of a particle‐in‐cell–Monte Carlo collisions model are explained for a magnetron discharge, whereas the capabilities of a hybrid Monte Carlo–fluid approach are illustrated for a direct current glow discharge used for spectrochemical analysis of materials. Finally, some examples of molecular dynamics simulations, for the purpose of plasma‐deposition, are given. magnified image