In Situ Inkjet Printing Strategy for Fabricating Perovskite Quantum Dot Patterns

Abstract Perovskite quantum dots are emerging as attractive materials for photonic and optoelectronic applications. Patterning is an important step to incorporate them into display, anti‐counterfeiting, and optical chip applications. In this work, an in situ inkjet printing strategy is demonstrated for fabricating perovskite quantum dots patterns by printing perovskite precursor solutions onto a polymeric layer. Importantly, this strategy can achieve bright photoluminescence with a quantum yield up to 80% and shows broad applicability to a variety of perovskites and polymers. Moreover, the as‐fabricated perovskite quantum dots patterns are composed of a microdisks array on the surface of polymeric layer. The size of these microdisks can be varied by adjusting the printing temperature. To demonstrate the potential use in display and advanced anti‐counterfeiting applications, color pixel patterns and 2D code pattern are fabricated by varying the precursor solutions. The combination of superior photoluminescence properties, simple process, and low cost makes the in situ inkjet printing strategy very promising for patterning perovskite quantum dots toward photonic integrations.