A spectroscopic total-integrated-scatter instrument has been constructed. It uses a Coblentz sphere for the collection of the scattered light and a lamp with a monochromator as a light source. It can be used to measure diffuse reflectance as well as transmittance. The instrument has been used to measure diffuse reflectance of thermally and chemical-vapor-deposition oxidized silicon wafers. Comparisons are made with measurements by using a spectrophotometer with an integrating sphere. The data have been interpreted with a parameterized model for light scattering from a double layer, to obtain rms surfaceroughness values for the two interfaces of the oxide film.
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Rönnow et al. (1993) studied this question.
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