A double-pass interferometer for measurement of dimensional changes

A double-pass interferometer was developed for measuring dimensional changes of materials in a nanoscale absolute interferometric dilatometer. This interferometer realized the double-ended measurement of a sample using a single-detection double-pass interference system. The nearly balanced design, in which the measurement beam and the reference beam have equal optical path lengths except for the path difference caused by the sample itself, makes this interferometer have high stability, which is verified by the measurement of a quasi-zero-length sample. The preliminary experiments and uncertainty analysis show that this interferometer should be able to measure dimensional changes with characteristic uncertainty at the nanometer level.