Fluorine-Containing Polymers and the Emerging Nanotechnology

Fluorine-containing polymers, because of their unique properties, including: low permittivity, low friction, thermal stability, high resistance to chemical attack (especially oxidation), hold a central position in the emerging nanotechnology. Important areas where fluorine containing polymers hold a lot of promise are: Resist technology in photo and radiation lithographies as well as insulators in an emerging “nanoelectronics.” Fluorine-containing polymers (specifically fluoropolyimide, fluoropolyamic acid, fluoroimideamide and fluoropoly acrylates) have been synthesized. The polymers are soluble in a wide range of solvents. Their Langmuir-Blodgett (LB) monolayers and their ultrathin films have been fabricated. Techniques like AFM, surface plasmon resonance (SPR), reflection absorption infrared spectroscopy (RAIR), and dielectric spectroscopy have been used to obtain the surface morphology, film thickness, orientation on the substrate, and dielectric constant. The dielectric constant of 1.5 is the lowest so far reported according to my knowledge.