A 21 layer AlAs/Al0.4Ga0.6As multilayer structure, designed as a Bragg reflector centered at 670 nm, has been grown by chemical beam epitaxy. The growth was monitored in real time by dynamic optical reflectivity (DOR) using a 670 nm semiconductor diode laser. The resultant DOR trace was compared to a computer simulation for the growth structure and good agreement is obtained using layer thicknesses measured by transmission electron microscopy. The wavelength dependent reflectivity of the Bragg reflector was measured using a grating spectrometer and good agreement is obtained to a computer simulation once the dispersive complex refractive index is taken into account.
No takes yet. Share an insight, caveat, or question.
Armstrong et al. (1992) studied this question.
Synapse has enriched 4 closely related papers on similar clinical questions. Consider them for comparative context: