The ionization rates for holes and electrons in silicon have been determined over the following ranges of field: for holes, (2.5-6.0)×{}10⁵ volts cm^-1; for electrons, (2.0-5.0)×{}10⁵ volts cm^-1. The ionization rate for electrons is higher than that for holes. The results suggest that the field dependence of the ionization rate for holes and, probably, for electrons also, can be expressed by aexp(-b/E), where E is the field. The constants a and b are different for electrons and holes.
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A. G. Chynoweth (1958) studied this question.
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