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Thin films of niobium oxide (V) were prepared by low-pressure metalorganic chemical vapor deposition (LPMOCVD) from bis-dipivaloylmethanate niobium trichloride in a horizontal tube hot-wall reactor. The dependence of growth rate, crystal orientation, morphology and chemical composition on operating conditions were studied experimentally. The profile of the thin film grown on microscale trenches and the macroscopic growth rate distribution in the reactor were studied by micro/macro-numerical simulations.
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Jung et al. (1995) studied this question.
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