ZnMgO films are prepared by RF magnetron sputtering using a composite target and the Mg composition of the samples can be controlled easily even at a high growth temperature. The metal?semiconductor?metal photodetector based on the wurtzite Zn0.6Mg0.4O film exhibits a very low dark current (5?pA at |Vbias| = 3?V) and a high UV/visible rejection ratio (more than three orders of magnitude). The peak responsivity of the photodetector is at around 270?nm and a very sharp cutoff wavelength is at a wavelength of about 295?nm corresponding to the absorption edge of the Zn0.6Mg0.4O film.
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Liu et al. (2008) studied this question.
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