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A nonlithographic fabrication method of magnetic nanodot array by using porous anodized alumina formed on a glass substrate is studied. We carried out anodic oxidation of a sputtered Al film at the anodic voltage in the range of 10–30 V, and found that the density of the nanohole arrays increased with the decrease in anodization voltage. On the other hand, hole diameter decreased with the decrease in anodic voltage. Then TbFeCo is deposited onto this porous array by sputtering with a thickness of around 20 nm and subsequently overcoated with 5 nm tungsten (W) for the protection from surface oxidation. The TbFeCo deposited on this porous layer shows complete perpendicular anisotropy. The coercivity increased with the decrease in anodization voltage as well as hole diameter. The coercivity of the TbFeCo deposited on the porous array with a mean hole diameter of around 15 nm is 4.3 kOe. The squareness ratio is also improved with the reduction of the hole diameter. From the angular dependence of coercivity, Hc, it is found that the Hc decreases gradually with the decrease of applied field angle from the perpendicular direction (easy axis) to in-plane direction (hard axis). This indicates that the magnetization reversal in the TbFeCo nanodot array occurs by Stoner-Wohlfarth model.
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Rahman et al. (2006) studied this question.
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