Ultrafast interferometric microscopy for laser-driven shock wave characterization

We have applied ultrafast time-resolved two-dimensional interferometric microscopy to the measurement of shock wave breakout from thin metal films. This technique allows the construction of a two-dimensional breakout profile for laser generated impulsive shocks with temporal resolution of <300 fs and out-of-plane spatial resolution of 0.5 nm using 130 fs, 800 nm probe pulses. Constraints placed on the spatial extent of the probed region and on the spatial resolution of the technique by the short duration of the probe pulses are discussed. In combination with other techniques, such as spectral interferometry, this technique provides a powerful means of investigating shock dynamics in a variety of materials.