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Sputtering yields from the (111), (100), and (110) planes of copper single crystals were measured as a function of normally incident argon-ion energy over the range from 100 to 200 000 eV. A comparison of the ratios of the yield curves as a function of ion energy reveals that lattice ``transparency'' is apparently not sufficient for a complete theoretical description of the sputtering process.
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Snouse et al. (1966) studied this question.
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