We show how scalar diffraction theory can be used to quantitatively evaluate insertion losses in integrated optic spectrometers based on planar waveguide and etched grating technologies. This approach is applied to optimize the loss-limited spectral operating range of these devices. We also show how limitations in the photolithographic process used for grating definition can result in appreciable spectrometer insertion losses.>
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Deri et al. (1994) studied this question.
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