The patterning of carbon nanostructures by electron beam stimulated oxidation is described. Sputter deposited carbon thin films and carbon nanotubes are locally oxidized in a scanning electron microscope using injected water vapor. The resulting structures are examined with scanning electron microscopy and transmission electron microscopy. The electrical resistance obtained postprocessing is comparable to the as-deposited values. Linewidths are demonstrated down to 20 nm along with sub-2 nm nanowire fabrication in sputtered carbon films. A carbon nanowire is fabricated using this process and electrically characterized.
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Spinney et al. (2009) studied this question.
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