Microfabrication and evaluation of diffractive optical filters prepared by reactive sputter etching

Single or linearly superimposed square-wave surface-relief patterns in a transparent plate yield optical transmission characteristics similar to those of interference filters. Reactive sputter etching of fused quartz in CHF3 using Shipley 1350 H photoresist as an etch mask offers a well-controlled method to produce these complex structures. Gratings with periodicities of 1–2 μm and depths of up to 3 μm are fabricated with dimensional tolerances of ±0.02 μm using laser interferometric techniques. Superposition is obtained by successive masking and etching operations. The optical transmission characteristics of these diffractive filters are analyzed and compared with rigorous diffraction theory.