TiO₂DLAR coatings for planar silicon solar cells

In this paper we demonstrate that a double‐layer anti‐reflection (DLAR) coating can be fabricated using only titanium dioxide (TiO 2 ). Two TiO 2 thin films were deposited onto planar silicon wafers using a simple atmospheric pressure chemical vapour deposition (APCVD) system under different deposition conditions. Weighted average reflectances of 6.5% (measured) and 7.0% (calculated) were achieved for TiO 2 DLAR coatings in air and under glass, respectively. An increase in the short‐circuit current density of Δ J sc = 2.5 mA/cm 2 can be expected for an optimised TiO 2 DLAR coating when compared with a commercial TiO 2 single‐layer anti‐reflection coating.