The exchange biasing field (Heb) and coercive field (Hc) of molecular-beam-epitaxy (MBE) grown Cu/Ni80Fe20/Fe50Mn50 samples in [111], [001] and [110] orientations were investigated by Kerr effect measurements. A strong dependence of Heb and Hc on the growth orientation is observed. A strong uniaxial in-plane anisotropy introduced by the Fe50Mn50 layer was found for the [110]-oriented sample. Conversion electron Mössbauer studies revealed a roughness of 2–3 Å and no significant moment reduction at the Ni80Fe20/Fe50Mn50 interface.
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Florant et al. (1978) studied this question.