Soft-Shear-Aligned Vertically Oriented Lamellar Block Copolymers for Template-Free Sub-10 nm Patterning and Hybrid Nanostructures

This is the authors' abstract. We don't add key points for this paper.

The template-free unidirectional alignment of lamellar block copolymers ( l -BCPs) for sub-10 nm high-resolution patterning and hybrid multicomponent nanostructures is important for technological applications. We demonstrate a modified soft-shear-directed self-assembly (SDSA) approach for aligning pristine l -BCPs and l -BCPs with incorporated polymer-grafted nanoparticles (PGNPs), as well as the l -BCP conversion to aligned gold nanowires, and hybrid of metallic gold nanowire and dielectric silica nanoparticle in the form of line-dot nanostructures. The smallest patterns have a half-pitch as small as 9.8 nm. In all cases, soft-shear is achieved using a high-molecular-mass polymer topcoat layer, with support on a neutral bottom layer. We also show that the hybrid line-dot nanostructures have a red-shifted plasmonic response in comparison to neat gold nanowires. These template-free aligned BCPs and nanowires have potential use in nanopatterning applications, and the line-dot nanostructures should be useful in the sensing of biomolecules and other molecular species based on the plasmonic response of the nanowires.