We report a quantitative investigation of direct electron beam writing in monolayer films of passivated gold nanoclusters. In this process, the passivating organic ligands are (partially) removed to create gold-based nanostructures. We report the fabrication of lines with width as narrow as 26 nm, while measurements of the linewidth as a function of dose allow us to obtain a quantitative measure of the sensitivity, for comparison with established negative tone resists.
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Bedson et al. (2001) studied this question.
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