A study has been made of thin electron-beam-evaporated yttrium oxide films. The oxide structure was found to be polycrystalline, with grain sizes of the order of 100 Å, by electron microscopy. dc conduction measurements were made and a Frenkel-type of conduction mechanism was proposed. Step response and bridge dielectric loss measurements were compared. Internal photoemission was used to obtain metal/oxide barrier heights of 3.14 and 3.72 eV in an Al-Y2O3-Al structure.
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Riemann et al. (1973) studied this question.
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