Wafer‐Level Patterned and Aligned Polymer Nanowire/Micro‐ and Nanotube Arrays on any Substrate

A novel technique for fabrication of patterned and aligned polymer-nanowire/micro-and nanotube (PNW/PNT) arrays on a wafer-level substrate of any material is reported. By creating a designed pattern on a spin-coated polymer film using techniques, such as stamping or micro-tip writing, plasma etching results in the formation of aligned PNW arrays distributed according to the pattern.