Development of a multifunctional surface analysis system based on a nanometer scale scanning electron beam: Combination of ultrahigh vacuum-scanning electron microscopy, scanning reflection electron microscopy, Auger electron spectroscopy, and x-ray photoelectron spectroscopy

We have developed a multifunctional surface analysis system based on a scanning electron beam for nanofabrication and characterization of surface reactions for fabrication processes. The system performs scanning electron microscopy (SEM), scanning reflection electron microscopy (SREM), Auger electron spectroscopy (AES), and x-ray photoelectron spectroscopy. Nanometer scale resolution is obtained for ultrahigh vacuum (UHV)-SEM while the mechanical pumping instruments are operated. Single atomic steps on Si(111) surfaces are observed through SREM. Surface sensitive AES measurement is achieved with SREM geometry; this has a great advantage for investigating atomic step related surface reactions. High spatial resolution AES analysis is also achieved by using a nanometer scale probe beam. Auger electron signals from a hundred Ag atoms on a Si(111) surface are successfully detected with high sensitivity.