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Measurements of secondary-electron-emission (SEE) yield are reported for samples of clean 5890 PT graphite and for the same material exposed for some months in the JET Tokamak. The samples exposed in the JET Tokamak give substantially higher values than the clean samples. Controlled experiments show that both implantation with H 2 + ions and deposition of thin metal films increase the SEE yield. The experimental data have been integrated over a 3D Maxwellian distribution to obtain the values of effective SEE yield expected from a plasma as a function of electron temperature. From these SEE yields, theoretical values of sheath potential and sheath energy transmission factor have been calculated. The implications for ion sputtering and power loss are discussed.
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Woods et al. (1987) studied this question.
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