Deposition of “Polysiloxane” Thin Films Containing Silver Particles by an RF Asymmetrical Discharge

The aim of the present work is to produce silver‐containing SiC x O y H z thin films by using simultaneous sputtering of silver and plasma polymerization in an HMDSO plasma. The ratio of plasma polymerization to sputtering was adjusted by using a pulsed flow rate of the hexamethyldisiloxane precursor, which permitted an accurate control of the co‐deposition process. The presence of silver in the gas phase was detected by optical emission spectroscopy. The silver volume fraction was controlled over a wide range by superimposing physical sputtering onto the polymerization process taking place simultaneously within a very low and narrow range of HMDSO plasma pressure. The polymer matrix structures were analyzed by several techniques. FTIR spectra revealed the presence of SiOSi, SiCSi, SiCH 3 and CC groups whose amount varied with the silver content. TEM analysis showed Ag nanoparticles with sizes varying from 4 to 70 nm depending on the silver volume fraction. magnified image