Spin-on pure-silica-zeolite or Silicalite films are currently considered as outstanding low-k materials because of their stiffness and ultralow dielectric constant. It is shown that spin-on Silicalite films with low k values unavoidably contain cavities tens of nanometers wide, representing a considerable challenge in their application as on-chip interconnects.
No takes yet. Share an insight, caveat, or question.
Eslava et al. (2008) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: