Fabrication of Large‐Area Periodic Nanopillar Arrays for Nanoimprint Lithography Using Polymer Colloid Masks

Large‐area, well‐ordered, periodic nanopillar arrays (see Figure) can be fabricated using a combination of double‐layer nanosphere lithography and reactive ion etching. The nanopillar arrays fabricated by this method can, in turn, be used as the stamps for nanoimprint lithography. The results presented indicate that this approach can be used to produce large‐area sub‐50 nm periodic nanostructures.