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January 1, 2001Journal of Photopolymer Science and TechnologyOpen Access

Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication.

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Authors

SKStephen M. KueblerUniversity of Central FloridaMRMariacristina RumiWright-Patterson Air Force BaseTWToshiyuki WatanabeTokyo University of Technology

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Kuebler et al. (2001) studied this question.

synapsesocial.com/papers/6a7151cbf44fa9f079df1c02https://doi.org/10.2494/photopolymer.14.657
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