An atomic layer deposition–fluidized bed reactor (ALD–FBR) method has been developed to deposit ultrathin and conformal coatings on fine particles. Experiments of Al 2 O 3 deposition on 150‐μm‐diameter nickel particles were conducted. The fluidized bed was constructed to operate under vacuum, and the fluidizing gas used was nitrogen. Trimethylaluminum and water were used as dosing reagents. The reactions were conducted at 450 K. Successful deposition of alumina films, with thickness controllable at the nanometer level, was observed based on transmission electron microscopy imaging, inductively coupled plasma atomic emission spectrometry, X‐ray photoemission spectroscopy, particle‐size distributions, and wavelength‐dispersive spectrometry imaging.
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Wank et al. (2004) studied this question.
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