Experimental Verification of a Fundamental Model for Multiwafer Low‐pressure Chemical Vapor Deposition of Polysilicon

A fundamental model for multiwafer low‐pressure chemical vapor deposition of polysilicon has been developed and evaluated in terms of its ability to predict experimental data from two widely differing reactors. The model can predict the main features of polysilicon deposition in a small research reactor, even though the model parameters were estimated using data taken from a much larger industrial system. It is demonstrated that the assumption of thermal variations within the reactor can greatly improve model predictions.