High-performance fully-depleted SOI RF CMOS

A T-gate structure has been implemented in the fabrication of fully depleted silicon-on-insulator MOSFETs. The T-gate process is fully compatible with the standard CMOS and the resulting reduction of gate-resistance significantly improved the RF performance. Measured fmaxis 76 GHz and 63 GHz for n- and p-MOSFET with 0.2-μm gate length, respectively. At 2 GHz, a minimum noise figure of 0.4 dB was measured on an n-MOSFET with the T-gate structure.