Titanium diboride was synthesized by the vaporphase reaction of the chlorides of titanium and boron on a heated substrate. Under certain described conditions, the resulting deposit was found to have a preferred atomic arrangement which could be described as alternating layers of titanium and boron atoms perpendicular to the plane of deposition. Room‐temperature physical properties were determined and are reported.
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Gannon et al. (1963) studied this question.
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