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The nature of the relaxation process of the poled order in an interpenetrating polymer network (IPN) system is found to be fundamentally different from that of a guest/host system. The IPN (Tg= 176 deg C) consists of a nonlinear optical (NLO) active epoxy-based polymer network and an NLO active phenoxy-silicon polymer network. The decay behavior of the second-order nonlinearity of this IPN was investigated in the range from 110 to 170 deg C. The stability of this IPN is superior to those of classic guest/host polymers as indicated by longer relaxation times at temperatures from 110 to 130 deg C. The relaxation process of the IPN system follows Arrhenius type behavior at temperatures ranging from 140 to 170 deg C. The IPN system provides a new approach to processing for stabilization of the second-order nonlinear optical properties. Relaxation, Interpenetrating polymer network, Nonlinear optical, Arrhenius
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Chen et al. (1993) studied this question.
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