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A waveguide device is proposed for spot-size transformation of an optical beam from the 1 μm range to about 8 μm using a wedge-shaped taper. The structure can be entirely integrated on an InP-based optoelectronically integrated circuit. It is shown by numerical simulation that the width of the thin end of the wedge has a major influence on the transformation loss of such a device. By using direct writing e-beam lithography and reactive ion etching as well as subsequent InP regrowth, we were able to produce the required structures. The beamwidth transformation capability is confirmed by optical measurements.
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Zengerle et al. (1991) studied this question.
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