In this letter, we report, design and fabrication of good asymmetrical Si-blazed gratings with a pitch of 383 nm, fabricated in unibond silicon-on-insulator using angled ion-beam etching. An output efficiency of 84% was achieved. The devices allow efficient coupling to/from small waveguides, of the order of 1 μm in height.
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Ang et al. (2000) studied this question.
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