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Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiC:H Films from Trimethylsilane and Tetramethylsilane, Chiang, Chiu-Chih, Chen, Mao-Chieh, Ko, Chung-Chi, Wu, Zhen-Cheng, Jang, Syun-Ming, Liang, Mong-Song
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Chiang et al. (2003) studied this question.
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