We discuss the conversion efficiency and spectral characteristics of x-ray sources produced by focusing 0.26 μm radiation on targets. We optimize the x-ray emission in given spectral ranges by choosing the appropriate target atomic number and irradiation conditions. We study the exposure of PBS photoresist with well characterized subkilovolt and kilovolt x-rays and find the sensitivity as well as the contrast of the resist increase with subkiloelectron volt radiation. The results confirm that the value of x-ray energy per unit volume absorbed at the resist surface is approximately independent of wavelength. A model for the development rate is also proposed to reproduce the experimental data.
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Pépin et al. (1987) studied this question.