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Practical methods of microfabrication are vital for the development of photonic-crystal-based signal processing. However, extension of the optical methods that dominate integrated circuit fabrication to three dimensions is challenging. This communication reports an essential step for creation of devices operating within a full photonic band gap: atomic layer deposition is used to create the high-index TiO2 replicas of holographically defined photonic crystals shown in the figure.
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King et al. (2006) studied this question.
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