Ge doping of β-Ga₂O₃ films grown by plasma-assisted molecular beam epitaxy

The Ge doping of β-Ga 2 O 3 (010) films was investigated using plasma-assisted molecular beam epitaxy as the growth method. The dependences of the amount of Ge incorporated on the substrate temperature, Ge-cell temperature, and growth regime were studied by secondary ion mass spectrometry. The electron concentration and mobility were investigated using Van der Pauw Hall patterns. Hall measurement confirmed that Ge acts as an n-dopant in β-Ga 2 O 3 (010) films. These results were compared with similar films doped by Sn. The Hall data showed an improved electron mobility for the same electron concentration when Ge is used instead of Sn as the dopant.