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A new selective deposition technology by electron beam induced surface reaction has been demonstrated. Cr line patterns were deposited using Cr(C 6 H 6 ) 2 as a source. Cr deposition was confirmed by analysis using XMA and AES. The deposited thickness is proportional to electron beam dose. A 0.15 µm linewidth Cr pattern was deposited at 5×10 -7 C/cm. This technology will be important for nanometer structure fabrication and new structure devices.
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Matsui et al. (1984) studied this question.
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