A modification of the cold-wall organometallic vapor-phase epitaxial (OMVPE) process for the growth of AlxGa1−xAs layers is described. Graphite baffles placed in the gas stream act to greatly increase the photoluminescence efficiency of the AlxGa1−xAs. Preliminary evidence indicates that the effect of the baffles may be to provide a solid surface upon which Al2O3 can be deposited from the reaction of trimethylaluminum with any residual O2 and/or H2O in the vapor phase. The ’’gettering’’ action apparently reduces oxygen contamination of the AlxGa1−xAs.
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Stringfellow et al. (1979) studied this question.
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